| 1. Identity statement | |
| Reference Type | Conference Paper (Conference Proceedings) |
| Site | mtc-m16.sid.inpe.br |
| Holder Code | isadg {BR SPINPE} ibi 8JMKD3MGPCW/3DT298S |
| Repository | sid.inpe.br/marciana/2004/01.13.16.39 |
| Last Update | 2004:03.30.03.00.00 (UTC) administrator |
| Metadata Repository | sid.inpe.br/marciana/2004/01.13.16.39.13 |
| Metadata Last Update | 2018:06.05.01.20.45 (UTC) administrator |
| Secondary Key | INPE-10401-PRE/5900 |
| Citation Key | KostovBarrUeda:2003:TwDiCo |
| Title | Two dimensional computer simulation of plasma immersion ion implantation  |
| Format | On-line |
| Year | 2003 |
| Access Date | 2024, May 19 |
| Secondary Type | PRE CI |
| Number of Files | 1 |
| Size | 925 KiB |
| 2. Context | |
| Author | 1 Kostov, Konstantin G. 2 Barroso, Joaquim José 3 Ueda, Mário |
| Resume Identifier | 1 2 3 8JMKD3MGP5W/3C9JHSB |
| Group | 1 LAP-INPE-MCT-BR |
| Affiliation | 1 Department of General Physics, Sofia University, Sofia 1164, Bulgaria 2 Instituto Nacional de Pesquisa Espaciais |
| Conference Name | Latin American Workshop on Plasma Physics, 10; Brazilian Meeting on Plasma Physics, 7. |
| Conference Location | São Pedro |
| Date | 30 Nov. - 5 Dec. 2003 |
| Book Title | Proceedings |
| Tertiary Type | Posters |
| History (UTC) | 2018-06-05 01:20:45 :: administrator -> marciana :: 2003 |
| 3. Content and structure | |
| Is the master or a copy? | is the master |
| Content Stage | completed |
| Transferable | 1 |
| Content Type | External Contribution |
| Keywords | tecnologia de plasma plasma technology |
| Abstract | Plasma Immersion Ion Implantation (PIII) was initially developed for metallurgical treatments where the line-of-sight nature of conventional ion beam implantation is always a critical issue for large and complex-shaped workpieces. Recently, however, a variety of dielectric and semiconductor applications have been investigated. In PIII technique a series of negative high-voltage pulses (usually less then -100 kV) is applied between a target, immersed in plasma, and the vacuum chamber wall. When a sudden negative voltage is applied to the target, electrons near the surface are driven away, leaving behind a uniform density ion matrix sheath. Subsequently, ions within the sheath are accelerated towards the target, and then implanted into the surface modifying the atomic composition and structure of the nearsurface region. To maintain the ion flux, the sheath-plasma edge is driven further away, exposing new ions that are extracted from the plasma and eventually implanted into the target. One critical issue for the utilization of PIII in commercial applications is a detailed knowledge of the fundamental processes occurring in the plasma and the surface region of the samples. Therefore considerable effort was invested in the development of 2D computer codes which simulate the temporal expansion of the plasma sheath and determine the energy and angular spread of the ions bombarding the surface. In all these investigations, a simplified picture of the plasma before the implantation phase was assumed, i.e. ions and electrons extend with homogeneous density throughout the plasma up to the wall. Thus, the structure of the sheath in front of the target is neglected and so are the gradients in ion density and ion drift motion. In the present work we deal with 2D computer simulation of PIII process including realistic plasma density distribution prior to the implantation phase. Before starting the implantation phase, firstly we establish a steady-state nitrogen plasma distribution in the simulation volume using gas ionization by primary electrons. The plasma density adapts itself self-consistently to a non-uniform density distribution, which is used as initial density distribution for the implantation phase. As a result we can obtain a more realistic description of the ion current density on the target, the matrix sheath expansion and dynamics. In addition, the effect of secondary electron emission and the role of external applied magnetic field on PIII process are studied in our simulation. |
| Area | FISPLASMA |
| Arrangement | urlib.net > BDMCI > Fonds > Produção anterior à 2021 > LABAP > Two dimensional computer... |
| doc Directory Content | access |
| source Directory Content | there are no files |
| agreement Directory Content | there are no files |
| 4. Conditions of access and use | |
| data URL | http://urlib.net/ibi/sid.inpe.br/marciana/2004/01.13.16.39 |
| zipped data URL | http://urlib.net/zip/sid.inpe.br/marciana/2004/01.13.16.39 |
| Language | en |
| Target File | Two Dimensional.pdf |
| User Group | administrator |
| Visibility | shown |
| Copy Holder | SID/SCD |
| 5. Allied materials | |
| Next Higher Units | 8JMKD3MGPCW/3ET2RFS |
| Citing Item List | sid.inpe.br/mtc-m21/2012/07.13.14.56.06 1 |
| Host Collection | sid.inpe.br/banon/2003/08.15.17.40 |
| 6. Notes | |
| Empty Fields | archivingpolicy archivist callnumber copyright creatorhistory descriptionlevel dissemination documentstage doi e-mailaddress edition editor electronicmailaddress identifier isbn issn label lineage mark mirrorrepository nextedition notes numberofvolumes orcid organization pages parameterlist parentrepositories previousedition previouslowerunit progress project publisher publisheraddress readergroup readpermission rightsholder schedulinginformation secondarydate secondarymark serieseditor session shorttitle sponsor subject tertiarymark type url versiontype volume |
| 7. Description control | |
| e-Mail (login) | marciana |
| update | |